Invention Grant
- Patent Title: Method for forming an impurity diffusion layer by applying a diffusing agent composition
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Application No.: US14562041Application Date: 2014-12-05
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Publication No.: US09620666B2Publication Date: 2017-04-11
- Inventor: Toshiro Morita , Takashi Kamizono
- Applicant: Tokyo Ohka Kogyo Co., Ltd.
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe, Martens, Olson & Bear LLP
- Priority: JP2010-253234 20101111
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L21/22 ; H01L21/225 ; H01L31/068 ; H01L51/00 ; H01L51/44 ; H01L51/52 ; H01L21/228
Abstract:
A diffusing agent composition including a condensation product and an impurity diffusion component. The condensation product is a reaction product resulting from hydrolysis of an alkoxysilane. The impurity diffusion component is a monoester or diester of phosphoric acid, or a mixture thereof.
Public/Granted literature
- US20150140718A1 DIFFUSING AGENT COMPOSITION, AND METHOD FOR FORMING AN IMPURITY DIFFUSION LAYER Public/Granted day:2015-05-21
Information query
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