Invention Grant
- Patent Title: Nitride semiconductor light emitting element and method for manufacturing same
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Application No.: US14407241Application Date: 2013-05-15
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Publication No.: US09620671B2Publication Date: 2017-04-11
- Inventor: Hiroshi Nakatsu , Tomoya Inoue , Kentaro Nonaka , Toshiaki Asai , Tadashi Takeoka , Yoshihiko Tani
- Applicant: Sharp Kabushiki Kaisha
- Applicant Address: JP Osaka-shi
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Osaka-shi
- Agency: Morrison & Foerster LLP
- Priority: JP2012-133489 20120613
- International Application: PCT/JP2013/063482 WO 20130515
- International Announcement: WO2013/187171 WO 20131219
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/06 ; H01L33/12 ; H01L33/24 ; H01L33/32 ; H01L33/22 ; H01L33/02

Abstract:
A nitride semiconductor light emitting element is provided with: a substrate; a buffer layer that is provided on the substrate; a base layer that is provided on the buffer layer; an n-side nitride semiconductor layer that is provided on the base layer; an MQW light emitting layer that is provided on the n-side nitride semiconductor layer; and a p-side nitride semiconductor layer that is provided on the MQW light emitting layer. An x-ray rocking curve half-value width ω (004) with respect to a (004) plane, i.e., the crystal plane of the nitride semiconductor, is 40 arcsec or less, or the x-ray rocking curve half-value width ω (102) with respect to a (102) plane is 130 arcsec or less, and the rate P (80)/P (25) between light output P (25) at 25° C. and light output P (80) at 80° C. with a same operating current is 95% or more.
Public/Granted literature
- US20150171263A1 NITRIDE SEMICONDUCTOR LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING SAME Public/Granted day:2015-06-18
Information query
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