Invention Grant
- Patent Title: Method of operating a semiconductor device having an IGBT and desaturation channel structure
-
Application No.: US14679583Application Date: 2015-04-06
-
Publication No.: US09621133B2Publication Date: 2017-04-11
- Inventor: Johannes Georg Laven , Hans-Joachim Schulze
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/73
- IPC: H01L29/73 ; H03K3/012 ; H01L29/66 ; H01L29/739 ; H03K17/041 ; H01L29/10 ; H03K17/60

Abstract:
A semiconductor device is operated by applying a gate voltage with a first value to a gate electrode terminal such that current flows through the IGBT between first and second electrode terminals and current flow through a desaturation channel is substantially blocked. A gate voltage with a second value is applied to the gate electrode terminal the absolute value of which is lower than that of the first value, such that current flows through the IGBT between the first and second electrode terminals and charge carriers flow as a desaturating current through the desaturation channel to the first electrode terminal. A gate voltage with a third value is applied to the gate electrode terminal, the absolute value of which is lower than that of the first and second values, such that current flow through the IGBT between the first and second electrode terminals is substantially blocked.
Public/Granted literature
- US20150214930A1 Method of Operating a Semiconductor Device having an IGBT and Desaturation Channel Structure Public/Granted day:2015-07-30
Information query
IPC分类: