Invention Grant
- Patent Title: Imaging on substrates with alkaline strippable UV blocking compositions and aqueous soluble UV transparent films
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Application No.: US14853364Application Date: 2015-09-14
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Publication No.: US09622353B2Publication Date: 2017-04-11
- Inventor: Krishna Balantrapu , Brian D. Amos , Stephen McCammon
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent John J. Piskorski
- Main IPC: G03F7/12
- IPC: G03F7/12 ; H05K3/00 ; G03F7/09 ; G03F7/20 ; G03F7/42 ; G03F7/32 ; G03F7/035 ; G03F7/038 ; G03F7/11 ; H05K3/28 ; H05K3/34
Abstract:
Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline strippable UV blocking composition is selectively applied to the surface of the UV transparent film to function as a mask. UV light is applied to portions of the UV photosensitive material not covered by the mask. The UV blocking composition, UV transparent film and selective sections of the UV photosensitive material are simultaneously removed with an aqueous alkaline developer solution to form an image on the substrate.
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