Invention Grant
- Patent Title: Electroplating apparatus with improved throughput
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Application No.: US14286841Application Date: 2014-05-23
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Publication No.: US09624595B2Publication Date: 2017-04-18
- Inventor: Jianming Fu , Wen Zhong Kong
- Applicant: Silevo, Inc.
- Applicant Address: US CA San Mateo
- Assignee: SolarCity Corporation
- Current Assignee: SolarCity Corporation
- Current Assignee Address: US CA San Mateo
- Agency: Park, Vaughan, Fleming & Dowler LLP
- Agent Shun Yao
- Main IPC: C25D17/00
- IPC: C25D17/00 ; C25D17/06 ; C25D17/08 ; C25D17/10

Abstract:
One embodiment provides an electroplating apparatus, which includes a tank filled with an electrolyte solution, a number of anodes situated around edges of the tank, a cathode situated above the tank, and a plurality of wafer-holding jigs attached to the cathode. A respective wafer-holding jig includes a common connector electrically coupled to the cathode and a pair of wafer-mounting frames electrically coupled to the common connector. Each wafer-mounting frame includes a plurality of openings, and a respective opening provides a mounting space for a to-be-plated solar cell, thereby facilitating simultaneous plating of front and back surfaces of the plurality of the solar cells.
Public/Granted literature
- US20140346035A1 ELECTROPLATING APPARATUS WITH IMPROVED THROUGHPUT Public/Granted day:2014-11-27
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