A dual retention apparatus comprises: a locking pin; a pin retaining device, the pin slidable therein, comprising: a starting pin position; a pin locking mechanism; a partial pin locking mechanism; a pin path from the starting pin position to the pin locking mechanism, the partial pin locking mechanism located on the pin path and configured to prevent the pin from sliding back towards the starting pin position and allowing the pin to slide towards the pin locking mechanism, the pin locking mechanism configured to lock the pin therein; and a pin return path from the pin locking mechanism to the starting position, the pin return path bypassing the partial pin locking mechanism; and, a biasing device configured to relatively bias the pin along at least a portion of the pin path towards the pin locking mechanism, and further bias the pin into the pin locking mechanism.