Invention Grant
- Patent Title: Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component
-
Application No.: US14643490Application Date: 2015-03-10
-
Publication No.: US09625814B2Publication Date: 2017-04-18
- Inventor: Sadaaki Katou , Junichi Kamei
- Applicant: Hitachi Chemical Company, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Priority: JP2010-116234 20100520; JP2010-187658 20100824; JP2010-187662 20100824
- Main IPC: G03F7/038
- IPC: G03F7/038 ; C08F2/48 ; H03H9/10 ; B32B1/06 ; G03F7/028 ; G03F7/031 ; G03F7/20 ; H03H9/64 ; G03F7/027 ; G03F7/40 ; C08F222/10

Abstract:
Provided are a photosensitive resin composition which is excellent in a moisture and heat resistance and provides a cured product thereof with a high elastic modulus at high temperature and which is excellent as well in a hollow structure holding property and a photosensitive film prepared by using the same, a forming method for a rib pattern, a hollow structure and a forming method for the same and an electronic component. In an electronic component having a hollow structure, a photosensitive resin composition is used as a rib material or a cover material for forming the hollow structure described above, and it is characterized by using a photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group and (B) a photopolymerization initiator and a photosensitive film obtained from the above photosensitive resin composition. Used as the component (A) are acrylate compounds or methacrylate compounds, to be specific, an acrylate compound or a methacrylate compound having an amide group and an acrylate compound or a methacrylate compound containing a urethane bond.
Public/Granted literature
Information query
IPC分类: