Invention Grant
- Patent Title: Methods of forming patterns using photoresist polymers
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Application No.: US14886155Application Date: 2015-10-19
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Publication No.: US09625816B2Publication Date: 2017-04-18
- Inventor: Jin Park , Hyun-Woo Kim , Jin-Kyu Han
- Applicant: Jin Park , Hyun-Woo Kim , Jin-Kyu Han
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Priority: KR10-2014-0167424 20141127
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/36 ; G03F7/32 ; G03F7/20 ; G03F7/16 ; G03F7/26 ; G03F7/004 ; G03F7/30
Abstract:
A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.
Public/Granted literature
- US20160154306A1 METHODS OF FORMING PATTERNS USING PHOTORESIST POLYMERS Public/Granted day:2016-06-02
Information query
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