Invention Grant
- Patent Title: Method for processing a carrier
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Application No.: US14511199Application Date: 2014-10-10
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Publication No.: US09627196B2Publication Date: 2017-04-18
- Inventor: Guenther Ruhl , Klemens Pruegl
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Agency: Viering, Jentschura & Partner mbB
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L29/16 ; H01L21/02 ; C01B31/04

Abstract:
According to various embodiments, a method for processing a carrier may include: co-depositing at least one metal from a first source and carbon from a second source over a surface of the carrier to form a first layer; forming a second layer over the first layer, the second layer including a diffusion barrier material, wherein the solubility of carbon in the diffusion barrier material is less than in the at least one metal; and forming a graphene layer at the surface of the carrier from the first layer by a temperature treatment.
Public/Granted literature
- US20160104640A1 METHOD FOR PROCESSING A CARRIER Public/Granted day:2016-04-14
Information query
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