Invention Grant
- Patent Title: Metallic oxide thin film transistor, array substrate and their manufacturing methods, display device
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Application No.: US14771267Application Date: 2014-12-24
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Publication No.: US09627414B2Publication Date: 2017-04-18
- Inventor: Lei Zhao , Wei Guo
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: CN201410384418 20140806
- International Application: PCT/CN2014/093649 WO 20141224
- International Announcement: WO2016/019672 WO 20160211
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L27/12 ; H01L21/34 ; H01L21/02 ; H01L21/027 ; H01L21/467 ; H01L21/4757 ; H01L29/24 ; H01L29/423 ; H01L29/66
Abstract:
The present invention provides a metallic oxide thin film transistor and its manufacturing method, an array substrate and its manufacturing method, as well as a display device, which is belong to the field of thin film transistor manufacturing technology. The method for manufacturing the metallic oxide thin film transistor comprises a step of forming patterns of an oxide active layer and an etch stopping layer through a one-time patterning process.
Public/Granted literature
- US20160365366A1 METALLIC OXIDE THIN FILM TRANSISTOR, ARRAY SUBSTRATE AND THEIR MANUFACTURING METHODS, DISPLAY DEVICE Public/Granted day:2016-12-15
Information query
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