Invention Grant
- Patent Title: Method for forming high-definition metal pattern, high-definition metal pattern, and electronic component
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Application No.: US14441605Application Date: 2014-03-06
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Publication No.: US09629253B2Publication Date: 2017-04-18
- Inventor: Sunao Yoshihara , Haruhiko Katsuta , Yoshinori Katayama , Jun Shirakami , Akira Murakawa , Wataru Fujikawa , Yukie Saitou
- Applicant: DIC Corporation
- Applicant Address: JP Tokyo
- Assignee: DIC Corporation
- Current Assignee: DIC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Priority: JP2013-049043 20130312
- International Application: PCT/JP2014/055833 WO 20140306
- International Announcement: WO2014/142008 WO 20140918
- Main IPC: B05D5/12
- IPC: B05D5/12 ; H05K3/18 ; C23C18/30 ; H05K1/02 ; H05K3/20

Abstract:
Provided are a method for forming a high-definition metal pattern which including the steps of (1) forming a receiving layer on a substrate by coating the substrate with a resin composition including a urethane resin having a weight-average molecular weight of five thousand or more or a vinyl resin and a medium, (2) forming a plating-core pattern on the receiving layer by printing an ink including a particle that serves as a plating core on the receiving layer by reverse offset printing, and (3) depositing a metal on the plating-core pattern by electroless plating, a high-definition metal pattern formed by the above-described method, and an electronic component including the high-definition metal pattern.
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