Invention Grant
- Patent Title: Gas nozzle, plasma apparatus using the same, and method for manufacturing gas nozzle
-
Application No.: US14354709Application Date: 2012-10-30
-
Publication No.: US09633822B2Publication Date: 2017-04-25
- Inventor: Atsushi Tanaka
- Applicant: KYOCERA Corporation
- Applicant Address: JP Kyoto
- Assignee: Kyocera Corporation
- Current Assignee: Kyocera Corporation
- Current Assignee Address: JP Kyoto
- Agency: Volpe and Koenig, P.C.
- Priority: JP2011-239311 20111031
- International Application: PCT/JP2012/077978 WO 20121030
- International Announcement: WO2013/065666 WO 20130510
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C04B35/443 ; C23C16/44 ; C23C16/455 ; C04B35/44 ; C04B35/505 ; C04B35/626 ; B24B37/00 ; B24B37/04 ; C04B35/03

Abstract:
[Object] To provide a gas nozzle which meets a requirement to suppress the fall of particles.[Solution] A gas nozzle 4 according to an aspect of the present invention includes a columnar main body 13 formed of a ceramic sintered body provided with a through-hole 12 formed therein through which a gas flows, an exhaust port 15 of the through-hole 12 for the gas is formed in one end surface S1 of the main body 13, and the mean width of the profile elements (Rsm) of the one end surface S1 is 5 times or more the average crystalline grain diameter of the ceramic sintered body.
Public/Granted literature
- US20140283995A1 GAS NOZZLE, PLASMA APPARATUS USING THE SAME, AND METHOD FOR MANUFACTURING GAS NOZZLE Public/Granted day:2014-09-25
Information query