Invention Grant
- Patent Title: Tunnel field-effect transistor, method for manufacturing same, and switch element
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Application No.: US14911609Application Date: 2014-08-12
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Publication No.: US09634114B2Publication Date: 2017-04-25
- Inventor: Takashi Fukui , Katsuhiro Tomioka
- Applicant: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY , JAPAN SCIENCE AND TECHNOLOGY AGENCY
- Applicant Address: JP Hakkaido JP Saitama
- Assignee: National University Corporation Hakkaido University,Japan Science and Technology Agency
- Current Assignee: National University Corporation Hakkaido University,Japan Science and Technology Agency
- Current Assignee Address: JP Hakkaido JP Saitama
- Agency: Brundidge & Stanger, P.C.
- Priority: JP2013-168048 20130813
- International Application: PCT/JP2014/004175 WO 20140812
- International Announcement: WO2015/022777 WO 20150219
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/66 ; H01L21/02 ; H01L29/04 ; H01L29/08 ; H01L29/40 ; B82Y10/00 ; H01L29/41 ; B82Y40/00

Abstract:
A tunnel field-effect transistor (TFET) is configured by disposing a III-V compound semiconductor nano wire on a (111) plane of a IV semiconductor substrate exhibiting p-type conductivity, and arbitrarily disposing electrodes of a source, drain and gate. Alternatively, the tunnel field-effect transistor is configured by disposing a III-V compound semiconductor nano wire on a (111) plane of a IV semiconductor substrate exhibiting n-type conductivity, and arbitrarily disposing electrodes of a source, drain and gate. The nano wire is configured from a first region and a second region. For instance, the first region is intermittently doped with a p-type dopant, and the second region is doped with an n-type dopant.
Public/Granted literature
- US20160204224A1 TUNNEL FIELD-EFFECT TRANSISTOR, METHOD FOR MANUFACTURING SAME, AND SWITCH ELEMENT Public/Granted day:2016-07-14
Information query
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