Invention Grant
- Patent Title: Polymeric matrices formed from monomers comprising a protected amine group
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Application No.: US14465108Application Date: 2014-08-21
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Publication No.: US09636643B2Publication Date: 2017-05-02
- Inventor: Qingshan Jason Niu
- Applicant: GENERAL ELECTRIC COMPANY
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Main IPC: C08G69/42
- IPC: C08G69/42 ; B01D71/60 ; B01D67/00 ; B01D69/12 ; B01D71/56 ; B01D61/08 ; C08G69/26 ; C08G69/32 ; B01D61/02
Abstract:
The present disclosure relates to polymeric matrices composed of protected amine compound residues and membranes composed from such polymeric matrices. In particular, the present disclosure relates to a polymeric matrix comprising amine compound residues, acyl compound residues and protected amine compound residues.
Public/Granted literature
- US20140360932A1 POLYMERIC MATRICES FORMED FROM MONOMERS COMPRISING A PROTECTED AMINE GROUP Public/Granted day:2014-12-11
Information query
