Invention Grant
- Patent Title: Crystalline silicon ingot including nucleation promotion layer
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Application No.: US14154497Application Date: 2014-01-14
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Publication No.: US09637391B2Publication Date: 2017-05-02
- Inventor: Wen-Huai Yu , Cheng-Jui Yang , Yu-Min Yang , Kai-Yuan Pai , Wen-Chieh Lan , Chan-Lu Su , Yu-Tsung Chiang , Sung-Lin Hsu , Wen-Ching Hsu , Chung-Wen Lan
- Applicant: Sino-American Silicon Products Inc.
- Applicant Address: TW Hsinchu
- Assignee: Sino-American Silicon Products Inc.
- Current Assignee: Sino-American Silicon Products Inc.
- Current Assignee Address: TW Hsinchu
- Agency: Osha Liang LLP
- Priority: TW100143484A 20111128
- Main IPC: C30B29/06
- IPC: C30B29/06 ; C01B33/02 ; C30B11/00 ; H01L31/18

Abstract:
A crystalline silicon ingot and a method of fabricating the same are provided. The method utilizes a nucleation promotion layer to facilitate a plurality of silicon grains to nucleate on the nucleation promotion layer from a silicon melt and grow in a vertical direction into silicon grains until the silicon melt is completely solidified. The increment rate of defect density in the silicon ingot along the vertical direction has a range of 0.01%/mm˜10%/mm.
Public/Granted literature
- US20140127496A1 CRYSTALLINE SILICON INGOT INCLUDING NUCLEATION PROMOTION LAYER AND METHOD OF FABRICATING THE SAME Public/Granted day:2014-05-08
Information query
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