Invention Grant
- Patent Title: Xylylene diamine composition, and method for producing polyamide resin
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Application No.: US15032020Application Date: 2014-10-29
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Publication No.: US09637594B2Publication Date: 2017-05-02
- Inventor: Tatsuya Tochihara , Katsumi Shinohara , Takashi Nakamura , Hajime Yamada , Jun Mitadera , Takashi Yamamoto
- Applicant: Mitsubishi Gas Chemical Company, Inc.
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery LLP
- Priority: JP2013-227257 20131031; JP2013-227258 20131031
- International Application: PCT/JP2014/078734 WO 20141029
- International Announcement: WO2015/064626 WO 20150507
- Main IPC: C08G69/26
- IPC: C08G69/26 ; C08G69/28 ; C08G59/50 ; C08G69/30

Abstract:
Provided are [1] a xylylenediamine composition containing xylylenediamine and a compound represented by the following general formula (1), wherein the content of the compound represented by the general formula (1) is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine; and a method for producing a polyamide resin including the steps of introducing a compound represented by the following general formula (1), a diamine including xylylenediamine (but excluding the compound represented by the general formula (1)), and a dicarboxylic acid into a reaction system and performing a polycondensation reaction, wherein the amount of the compound represented by the general formula (1) to be introduced is 0.001 to 0.1 parts by mass based on 100 parts by mass of the xylylenediamine, where, in the general formula (1), n and m each independently represent an integer of 0 to 6, excluding the case where n and m are both 1.
Public/Granted literature
- US20160304671A1 XYLYLENE DIAMINE COMPOSITION, AND METHOD FOR PRODUCING POLYAMIDE RESIN Public/Granted day:2016-10-20
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