Invention Grant
- Patent Title: Apparatus for providing sample gas and related methods
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Application No.: US14148331Application Date: 2014-01-06
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Publication No.: US09638609B2Publication Date: 2017-05-02
- Inventor: Jong-Cheol Jeong , Kyung-Hwan Jeong , Jong-Soo Kim , Pil-Kwon Jun
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2013-0006003 20130118
- Main IPC: G01N1/22
- IPC: G01N1/22 ; G01N33/00

Abstract:
An apparatus for providing a sample gas includes a gas dosing part, a first pressure gauge for measuring a pressure of a sample gas dosed through the gas dosing part, a plurality of flow lines positioned between the gas dosing part and a gas analyzer that can be opened or closed according to the pressure measured by the first pressure gauge, a plurality of control valves respectively formed in the plurality of flow lines and controlling the plurality of flow lines to be opened or closed, a bypass line formed on at least one of the plurality of flow lines and exhausting some of the sample gas flowing along the flow lines, and a controller for selecting one of the plurality of flow lines according to the pressure measured by the first pressure gauge and controlling the control valves formed in the selected flow line.
Public/Granted literature
- US20140206097A1 Apparatus for Providing Sample Gas and Related Methods Public/Granted day:2014-07-24
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