Invention Grant
- Patent Title: Probe device having cleaning mechanism for cleaning connection conductor
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Application No.: US14781003Application Date: 2014-03-18
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Publication No.: US09638719B2Publication Date: 2017-05-02
- Inventor: Eiichi Shinohara , Munetoshi Nagasaka , Yoshiyasu Kato
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2013-067810 20130328
- International Application: PCT/JP2014/058151 WO 20140318
- International Announcement: WO2014/157122 WO 20141002
- Main IPC: G01R3/00
- IPC: G01R3/00 ; G01R31/28 ; G01R1/073

Abstract:
A probe device includes an electrode plate arranged above a mounting table for mounting thereon a semiconductor wafer and electrically connected to a tester, a connection conductor arranged at a side of the mounting table and electrically connected to a mounting table electrode formed on a mounting surface of the mounting table, and a cleaning mechanism including a polishing unit for polishing a contact portion of the connection conductor, a brush cleaning unit for performing a brush-cleaning of the contact portion, and a contact resistance measuring unit for measuring a contact resistance of the contact portion. The mounting table electrode is in contact with a backside electrode of a semiconductor device of the semiconductor wafer. When the connection conductor is connected to the electrode plate, a backside electrode formed on a backside of the semiconductor device and the tester are electrically connected to each other.
Public/Granted literature
- US20160054357A1 PROBE DEVICE Public/Granted day:2016-02-25
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