- Patent Title: Patterned phase difference film and method for manufacturing same
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Application No.: US14351346Application Date: 2012-10-01
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Publication No.: US09638848B2Publication Date: 2017-05-02
- Inventor: Yuya Inomata , Kumiko Kambara , Masanori Fukuda , Hideki Usuki , Keiji Kashima , Kazuki Yamada
- Applicant: DAI NIPPON PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: DAI NIPPON PRINTING CO., LTD.
- Current Assignee: DAI NIPPON PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2011-226771 20111014; JP2012-045592 20120301
- International Application: PCT/JP2012/075328 WO 20121001
- International Announcement: WO2013/054673 WO 20130418
- Main IPC: G02B5/30
- IPC: G02B5/30 ; G02B27/22 ; G03F7/00 ; G02B27/26 ; G02F1/1335 ; G02F1/13363

Abstract:
A pattern phase difference film is manufactured by a process including a laminate body formation step of applying a pattern alignment layer composition on a substrate to form a laminate body, a heat-drying layer formation step of heat-drying the composition to form a heat-dried layer, a pattern alignment layer formation step of irradiating a polarization pattern onto the heat-dried layer to form a pattern alignment layer, and a phase difference layer formation step of forming a phase difference layer including a rod-shaped compound on the pattern alignment layer. During the steps between the heat-drying layer formation step and the phase difference layer formation step, the heat-dried layer and the pattern alignment layer are exposed to the air for four hours or less.
Public/Granted literature
- US20140268002A1 PATTERNED PHASE DIFFERENCE FILM AND METHOD FOR MANUFACTURING SAME Public/Granted day:2014-09-18
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