Invention Grant
- Patent Title: Conductive pattern formation method, conductive pattern-bearing substrate, and touch panel sensor
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Application No.: US14732817Application Date: 2015-06-08
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Publication No.: US09639189B2Publication Date: 2017-05-02
- Inventor: Hiroshi Yamazaki , Yoshimi Igarashi
- Applicant: Hitachi Chemical Company, Ltd.
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin and Flannery LLP
- Priority: JP2011-219176 20111003
- Main IPC: G06F3/047
- IPC: G06F3/047 ; H05K1/03 ; G06F3/041 ; H05K3/06 ; G03F7/027 ; G03F7/09 ; G03F7/095 ; G03F7/20 ; G03F7/00 ; H05K1/02 ; H05K1/09

Abstract:
A conductive pattern formation method of the present invention includes a first exposure step of radiating active light in a patterned manner to a photosensitive layer including a photosensitive resin layer provided on a substrate and a conductive film provided on a surface of the photosensitive resin layer on a side opposite to the substrate; a second exposure step of radiating active light, in the presence of oxygen, to some or all of the portions of the photosensitive layer not exposed at least in the first exposure step; and a development step of developing the photosensitive layer to form a conductive pattern following the second exposure step.
Public/Granted literature
- US20150271919A1 CONDUCTIVE PATTERN FORMATION METHOD, CONDUCTIVE PATTERN-BEARING SUBSTRATE, AND TOUCH PANEL SENSOR Public/Granted day:2015-09-24
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