Invention Grant
- Patent Title: Liquid treatment apparatus and liquid treatment method
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Application No.: US13985679Application Date: 2012-07-11
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Publication No.: US09640383B2Publication Date: 2017-05-02
- Inventor: Kazuhiro Aiura , Norihiro Ito , Takashi Nagai
- Applicant: Kazuhiro Aiura , Norihiro Ito , Takashi Nagai
- Applicant Address: JP Minato-ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-ku
- Agency: Burr & Brown, PLLC
- Priority: JP2011-185245 20110826
- International Application: PCT/JP2012/067685 WO 20120711
- International Announcement: WO2013/031390 WO 20130307
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67 ; G03F7/42
Abstract:
A liquid treatment apparatus includes a substrate holding member that holds a substrate horizontally, a rotation mechanism that rotates the substrate holding member; a chemical liquid nozzle that supplies a chemical liquid to the substrate held by the substrate holding member; a top plate that covers the substrate held by the substrate holding member from above the substrate; and at least one LED lamp that heats the substrate during a chemical liquid treatment by irradiating the substrate with light of a predetermined wavelength through the top plate from above the top plate.
Public/Granted literature
- US20130319476A1 LIQUID TREATMENT APPARATUS AND LIQUID TREATMENT METHOD Public/Granted day:2013-12-05
Information query
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