Invention Grant
- Patent Title: Wafer processing method
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Application No.: US15179063Application Date: 2016-06-10
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Publication No.: US09640420B2Publication Date: 2017-05-02
- Inventor: Masaru Nakamura
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2015-118922 20150612
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/683 ; H01L21/78 ; H01L23/544

Abstract:
A method of processing a wafer includes coating the front side of the wafer with a water-soluble liquid resin to form a thin film; fixing the wafer to a protective plate for protecting the front side of the wafer, with a bond material interposed between the protective plate and the thin film; holding by a chuck table the protective plate with the wafer fixed thereto and grinding the back side of the wafer to make the wafer have a predetermined thickness; releasing step of releasing the bond material together with the protective plate to which the wafer has been fixed; and supplying water to the bond material remaining on the front side of the wafer to remove the thin film together with the bond material.
Public/Granted literature
- US20160365270A1 WAFER PROCESSING METHOD Public/Granted day:2016-12-15
Information query
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