Invention Grant
- Patent Title: Thin film transistor substrate
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Application No.: US14948857Application Date: 2015-11-23
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Publication No.: US09640564B2Publication Date: 2017-05-02
- Inventor: Eiichi Sato , Shinya Ono
- Applicant: JOLED INC.
- Applicant Address: JP Tokyo
- Assignee: JOLED INC.
- Current Assignee: JOLED INC.
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2014-242244 20141128
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/423

Abstract:
A thin film transistor substrate including a thin film transistor and a capacitor formed of a pair of electrodes, which includes: a first electrode above a substrate; a first insulating film above the first electrode; a second electrode above the first insulating film; a second insulating film above the second electrode; and a semiconductor layer above the second insulating film, in which the capacitor includes the first electrode as one of the pair of electrodes and the second electrode as the other of the pair of electrodes, and the thin film transistor includes the second electrode as a gate electrode, the second insulating film as a gate insulating film, and the semiconductor layer as a channel layer.
Public/Granted literature
- US20160155762A1 THIN FILM TRANSISTOR SUBSTRATE Public/Granted day:2016-06-02
Information query
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