Invention Grant
- Patent Title: Methods of manufacturing wide band gap semiconductor device and semiconductor module, and wide band gap semiconductor device and semiconductor module
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Application No.: US14913747Application Date: 2014-07-17
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Publication No.: US09640619B2Publication Date: 2017-05-02
- Inventor: Mitsuhiko Sakai
- Applicant: Sumitomo Electric Industries, Ltd.
- Applicant Address: JP Osaka-shi
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka-shi
- Agency: Venable LLP
- Agent Michael A. Sartori; F. Brock Riggs
- Priority: JP2013-176884 20130828
- International Application: PCT/JP2014/069010 WO 20140717
- International Announcement: WO2015/029635 WO 20150305
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L21/78 ; H01L21/66 ; H01L23/00 ; H01L25/00 ; G01R31/12 ; H01L25/07 ; H01L29/78 ; H01L29/20

Abstract:
A method of manufacturing a wide band gap semiconductor device includes the steps of preparing a wide band gap semiconductor substrate, separating the wide band gap semiconductor substrate into a plurality of first semiconductor chips, fixing the plurality of first semiconductor chips on a fixation member, measuring a breakdown voltage of each of the first semiconductor chips while immersing at least the first semiconductor chips in inert liquid, and after the step of measuring a breakdown voltage of each of the first semiconductor chips, providing a plurality of second semiconductor chips each having each of the first semiconductor chips fixed on the fixation member, by cutting the fixation member.
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