Invention Grant
- Patent Title: SOI finfet with reduced fin width dependence
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Application No.: US14428561Application Date: 2013-09-10
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Publication No.: US09640664B2Publication Date: 2017-05-02
- Inventor: Franz Hofmann
- Applicant: Soitec
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR1258696 20120917
- International Application: PCT/EP2013/068706 WO 20130910
- International Announcement: WO2014/040981 WO 20140320
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L29/78 ; H01L27/12 ; H01L27/02 ; H01L29/66

Abstract:
The present invention relates to a method for polarizing at least a first finfet transistor and a second finfet transistor, wherein the first finfet transistor has a fin width bigger than the fin width of the second finfet transistor, and both the first finfet transistor and the second finfet transistor have a back gate, and the method comprising applying the same first voltage on the back gate of the first finfet transistor and on the back gate of the second finfet transistor so as to reduce the spread between the off-current value of the first finfet transistor and the off-current value of the second finfet transistor.
Public/Granted literature
- US20150214372A1 SOI FINFET WITH REDUCED FIN WIDTH DEPENDENCE Public/Granted day:2015-07-30
Information query
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