Invention Grant
- Patent Title: Method for producing the P-N junction of a thin-film photovoltaic cell and corresponding method for producing a photovoltaic cell
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Application No.: US14892462Application Date: 2014-05-23
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Publication No.: US09640687B2Publication Date: 2017-05-02
- Inventor: Giovanni Altamura , Louis Grenet , Simon Perraud , Frédéric Roux
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Current Assignee Address: FR Paris
- Agency: Christensen O'Connor Johnson Kindness PLLC
- Priority: FR1354696 20130524
- International Application: PCT/IB2014/061659 WO 20140523
- International Announcement: WO2014/188386 WO 20141127
- Main IPC: H01L31/0392
- IPC: H01L31/0392 ; H01L31/032 ; H01L31/072 ; H01L31/0749 ; H01L31/0224 ; H01L31/18

Abstract:
A method for producing a P-N junction in a thin film photovoltaic cell comprising a deposition step in which are carried out successively: a layer of precursors of a photovoltaic material of type P or N, a barrier layer and a layer of precursors of a semiconducting material of type N or P, this deposition step being followed by an annealing step carried out with a supply of S and/or Se, this annealing step leading to the formation of an absorbing layer of the type P or N and of a buffer layer of type N or P and of a P-N junction at the interface between said layers.
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