Invention Grant
- Patent Title: Diode having high brightness and method thereof
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Application No.: US14807632Application Date: 2015-07-23
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Publication No.: US09640713B2Publication Date: 2017-05-02
- Inventor: Myung Cheol Yoo
- Applicant: LG Innotek Co. Ltd.
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD.
- Current Assignee: LG INNOTEK CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L33/00 ; H01L33/38 ; H01L33/48 ; H01L33/22 ; H01L33/32 ; H01L33/46 ; H01L33/12 ; H01L33/42

Abstract:
A light emitting diode includes a transparent substrate and a GaN buffer layer on the transparent substrate. An n-GaN layer is formed on the buffer layer. An active layer is formed on the n-GaN layer. A p-GaN layer is formed on the active layer. A p-electrode is formed on the p-GaN layer and an n-electrode is formed on the n-GaN layer. A reflective layer is formed on a second side of the transparent substrate. Also, a cladding layer of AlGaN is between the p-GaN layer and the active layer.
Public/Granted literature
- US20150333217A1 DIODE HAVING HIGH BRIGHTNESS AND METHOD THEREOF Public/Granted day:2015-11-19
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