Invention Grant
- Patent Title: In situ clean apparatus and method thereof
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Application No.: US14057492Application Date: 2013-10-18
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Publication No.: US09643217B2Publication Date: 2017-05-09
- Inventor: Li-Hsing Chien , Yung-Ti Hung , Rouh Jier Wang , Yu-Te Chang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: B08B3/02
- IPC: B08B3/02 ; B08B9/027 ; B08B9/00

Abstract:
An apparatus includes a sprinkler configured for spraying liquid and a member with a nano-coating surface. The nano-coating surface is configured to receive liquid sprayed from the sprinkler. The apparatus further includes a sensor associated with the member and the sensor is configured to detect a signal directly or indirectly corresponding to a film deposition on the nano-coating surface. Moreover, the apparatus has a controller coupled with the sensor and the sprinkler, wherein the signal detected by the sensor is transmitted to the controller and the controller is configured to command the sprinkler spraying liquid on the nano-coating surface while a value of the signal reaches a threshold value.
Public/Granted literature
- US20150107623A1 IN SITU CLEAN APPARATUS AND METHOD THEREOF Public/Granted day:2015-04-23
Information query
IPC分类: