Invention Grant
- Patent Title: Ultrasonic cleaning method and apparatus
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Application No.: US13980312Application Date: 2012-01-17
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Publication No.: US09643221B2Publication Date: 2017-05-09
- Inventor: Yukio Eda , Toshiyuki Ibayashi , Hiroyuki Kurimura
- Applicant: Yukio Eda , Toshiyuki Ibayashi , Hiroyuki Kurimura
- Applicant Address: JP Tokyo
- Assignee: DENKA COMPANY LIMITED
- Current Assignee: DENKA COMPANY LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Stein IP, LLC
- Priority: JP2011-007986 20110118
- International Application: PCT/JP2012/050868 WO 20120117
- International Announcement: WO2012/099126 WO 20120726
- Main IPC: B08B3/08
- IPC: B08B3/08 ; B08B3/12 ; C03C23/00

Abstract:
There is provided an ultrasonic cleaning method capable of reliably cleaning to remove adhesive components even when the adhesive components adhere to a rigid substrate. The ultrasonic cleaning method comprises performing the following steps (1) to (5), in this order: (1) a step of immersing a rigid substrate having an adhesive adhering to a surface thereof in an aromatic alcohol-based cleaning liquid at 25 to 60° C.; (2) a step of cleaning off the adhesive on the rigid substrate by ultrasonic oscillation while keeping the state where the rigid substrate is immersed in the step (1); (3) a step of subsequently immersing the rigid substrate in a glycol ether-based cleaning liquid at 25 to 60° C.; (4) a step of rinsing off the aromatic alcohol-based cleaning liquid adhering to the rigid substrate by ultrasonic oscillation while keeping the state where the rigid substrate is immersed in the step (3); and (5) a step of subsequently rinsing off the glycol ether-based cleaning liquid and aromatic alcohol-based cleaning liquid adhering to the rigid substrate with water.
Public/Granted literature
- US20130298941A1 ULTRASONIC CLEANING METHOD AND APPARATUS Public/Granted day:2013-11-14
Information query
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