Invention Grant
- Patent Title: Method for producing trichlorosilane
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Application No.: US14648478Application Date: 2014-09-30
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Publication No.: US09643851B2Publication Date: 2017-05-09
- Inventor: YooSeok Kim , JeongKyu Kim , JinHyoung Yoo , JungWoo Lee , Eunsu Jang
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR Seoul
- Agency: Dentons US LLP
- Priority: KR10-2013-0116951 20130930; KR10-2014-0131843 20140930
- International Application: PCT/KR2014/009226 WO 20140930
- International Announcement: WO2015/047043 WO 20150402
- Main IPC: C01B33/107
- IPC: C01B33/107 ; B01J8/20 ; C01B33/021 ; B01J8/00 ; B01J19/24
Abstract:
The present invention relates to a method for producing trichlorosilane. The method includes dispersing metal silicon particles in liquid silane-based compounds containing tetrachlorosilane and optionally reacting the metal silicon particles with hydrogen chloride in the presence of hydrogen gas.
Public/Granted literature
- US20150344314A1 METHOD FOR PRODUCING TRICHLOROSILANE Public/Granted day:2015-12-03
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