• Patent Title: Method for manufacturing 1,1-disubstituted hydrazine compound
  • Application No.: US15119191
    Application Date: 2015-02-24
  • Publication No.: US09643942B2
    Publication Date: 2017-05-09
  • Inventor: Kanako SanukiKumi Okuyama
  • Applicant: ZEON CORPORATION
  • Applicant Address: JP Chiyoda-ku, Tokyo
  • Assignee: ZEON CORPORATION
  • Current Assignee: ZEON CORPORATION
  • Current Assignee Address: JP Chiyoda-ku, Tokyo
  • Agency: Kenja IP Law PC
  • Priority: JP2014-039673 20140228
  • International Application: PCT/JP2015/055122 WO 20150224
  • International Announcement: WO2015/129654 WO 20150903
  • Main IPC: C07D277/82
  • IPC: C07D277/82
Method for manufacturing 1,1-disubstituted hydrazine compound
Abstract:
This method for a manufacturing a 1,1-disubstituted hydrazine compound represented by a formula (II) involves reacting a hydrazino compound represented by a formula (I) with a compound represented by a formula: R-Hal in an aprotic polar solvent in the presence of a base selected from an alkali metal hydroxide and alkaline-earth metal hydroxide in an amount of 1.0 to 3.0 equivalents based on the hydrazino compound. In the formulae, X represents an oxygen atom, a sulfur atom, —CH2— or the like, and each of RX represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a cyano group, a nitro group, a fluoroalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms or the like. An arbitrary C—RX that forms the ring is optionally substituted with a nitrogen atom. Hal represents a chlorine atom, a bromine atom, or an iodine atom, and R represents a substituted or unsubstituted organic group having 1 to 12 carbon atoms.
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