Invention Grant
- Patent Title: Method for manufacturing 1,1-disubstituted hydrazine compound
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Application No.: US15119191Application Date: 2015-02-24
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Publication No.: US09643942B2Publication Date: 2017-05-09
- Inventor: Kanako Sanuki , Kumi Okuyama
- Applicant: ZEON CORPORATION
- Applicant Address: JP Chiyoda-ku, Tokyo
- Assignee: ZEON CORPORATION
- Current Assignee: ZEON CORPORATION
- Current Assignee Address: JP Chiyoda-ku, Tokyo
- Agency: Kenja IP Law PC
- Priority: JP2014-039673 20140228
- International Application: PCT/JP2015/055122 WO 20150224
- International Announcement: WO2015/129654 WO 20150903
- Main IPC: C07D277/82
- IPC: C07D277/82

Abstract:
This method for a manufacturing a 1,1-disubstituted hydrazine compound represented by a formula (II) involves reacting a hydrazino compound represented by a formula (I) with a compound represented by a formula: R-Hal in an aprotic polar solvent in the presence of a base selected from an alkali metal hydroxide and alkaline-earth metal hydroxide in an amount of 1.0 to 3.0 equivalents based on the hydrazino compound. In the formulae, X represents an oxygen atom, a sulfur atom, —CH2— or the like, and each of RX represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a cyano group, a nitro group, a fluoroalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms or the like. An arbitrary C—RX that forms the ring is optionally substituted with a nitrogen atom. Hal represents a chlorine atom, a bromine atom, or an iodine atom, and R represents a substituted or unsubstituted organic group having 1 to 12 carbon atoms.
Public/Granted literature
- US20170008862A1 METHOD FOR MANUFACTURING 1,1-DISUBSTITUTED HYDRAZINE COMPOUND Public/Granted day:2017-01-12
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