Invention Grant
- Patent Title: Compound, resin and photoresist composition
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Application No.: US15042880Application Date: 2016-02-12
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Publication No.: US09644056B2Publication Date: 2017-05-09
- Inventor: Tatsuro Masuyama , Yuki Suzuki , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-029320 20150218; JP2015-048101 20150311
- Main IPC: C08F216/38
- IPC: C08F216/38 ; C08F220/28 ; C08F220/22 ; G03F7/039 ; G03F7/004 ; G03F7/30 ; G03F7/38 ; G03F7/20 ; C07D321/04 ; C07D327/06 ; C08F220/18

Abstract:
A compound represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group; R2 represents a C1-C12 hydrocarbon group; Xa and Xb each independently represent an oxygen atom or a sulfur atom; X11 represents a C1-C12 divalent saturated hydrocarbon group where a hydrogen atom can be replaced by a fluorine atom; and A1 represents a C1-C12 divalent saturated hydrocarbon group or *-A2-X1-(A3-X2)a-A4-, where * represents a binding site to an oxygen atom, A2, A3 and A4 each independently represent a C1-C12 divalent hydrocarbon group, X1 and X2 each independently represent —O—, —CO—O—, —O—CO— or —O—CO—O—, and “a” represents 0 or 1.
Public/Granted literature
- US20160237190A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION Public/Granted day:2016-08-18
Information query
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