Compound, resin and photoresist composition
Abstract:
A compound represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group; R2 represents a C1-C12 hydrocarbon group; Xa and Xb each independently represent an oxygen atom or a sulfur atom; X11 represents a C1-C12 divalent saturated hydrocarbon group where a hydrogen atom can be replaced by a fluorine atom; and A1 represents a C1-C12 divalent saturated hydrocarbon group or *-A2-X1-(A3-X2)a-A4-, where * represents a binding site to an oxygen atom, A2, A3 and A4 each independently represent a C1-C12 divalent hydrocarbon group, X1 and X2 each independently represent —O—, —CO—O—, —O—CO— or —O—CO—O—, and “a” represents 0 or 1.
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