Invention Grant
- Patent Title: Method of producing structure containing phase-separated structure and method of forming top coat film
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Application No.: US14674515Application Date: 2015-03-31
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Publication No.: US09644110B2Publication Date: 2017-05-09
- Inventor: Takehiro Seshimo , Takaya Maehashi , Takahiro Dazai , Yoshiyuki Utsumi
- Applicant: Tokyo Ohka Kogyo Co., Ltd.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2014-080352 20140409
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C09D153/00 ; C09D183/00 ; G03F7/00 ; B82Y40/00

Abstract:
A method of producing a structure containing a phase-separated structure, including forming a layer containing a block copolymer on a substrate; applying a top coat material to the layer containing the block copolymer to form a top coat film; and subjecting the layer including the block copolymer having the top coat film formed thereon to annealing treatment so as to conduct a phase separation of the layer, the top coat material including an organic solvent component and a polymeric compound containing a structural unit having either a dicarboxylic acid or a salt of a dicarboxylic acid, and the organic solvent component containing water and an alcohol having 3 or more carbon atoms.
Public/Granted literature
- US20150291832A1 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE AND METHOD OF FORMING TOP COAT FILM Public/Granted day:2015-10-15
Information query
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