Invention Grant
- Patent Title: Method of fabricating composite PDMS microstructure
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Application No.: US14829621Application Date: 2015-08-18
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Publication No.: US09644257B2Publication Date: 2017-05-09
- Inventor: Fan-Gang Tseng , Pen-Cheng Wang , Tung-Yua Lee , Chun-Ting Lin
- Applicant: NATIONAL TSING HUA UNIVERSITY
- Applicant Address: TW Hsinchu
- Assignee: NATIONAL TSING HUA UNIVERSITY
- Current Assignee: NATIONAL TSING HUA UNIVERSITY
- Current Assignee Address: TW Hsinchu
- Agency: CKC & Partners Co., Ltd.
- Priority: TW104114760A 20150508
- Main IPC: C23C14/24
- IPC: C23C14/24 ; C23C14/14 ; C23C14/58 ; C23C14/02

Abstract:
A method of fabricating a composite PDMS microstructure includes a defining step, a depositing step and an etching step. The defining step is performed for defining a patterned area having a mono-molecule with a thiol group on a PDMS substrate, and the mono-molecule with the thiol group is in liquid phase. The depositing step is performed for placing the PDMS substrate having the mono-molecule with the thiol group into a vacuum chamber within an activation time so as to deposit one Au atom on the patterned area of the PDMS substrate by a vacuum coating process. The etching step is performed for cleaning the PDMS substrate using water, and thus the Au atom can be selectively retained on the patterned area of the PDMS substrate.
Public/Granted literature
- US20160326629A1 METHOD OF FABRICATING COMPOSITE PDMS MICROSTRUCTURE Public/Granted day:2016-11-10
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