Invention Grant
- Patent Title: Self-centering process shield
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Application No.: US14198569Application Date: 2014-03-05
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Publication No.: US09644262B2Publication Date: 2017-05-09
- Inventor: Ryan Hanson , Goichi Yoshidome , Nelson Yee
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/56 ; H01J37/32 ; H01J37/34

Abstract:
A process shield may include an elongated annular body having an outer surface and an inner surface; a lip extending radially outward from the outer surface of the body proximate a first end of the body such that a first portion of the body extends beyond the lip toward the first end; a plurality of openings in the lip; and a pin disposed in each of the plurality of openings to align the target assembly atop the process shield when the lid is placed atop the process shield, wherein the pin comprises an elongated body having a first surface with a beveled peripheral edge, wherein the first surface has a first diameter, a second surface opposing the first surface, wherein the second surface has a second diameter, and a sidewall, between the first surface and the second surface, wherein the sidewall has a concave portion having a third diameter.
Public/Granted literature
- US20140261175A1 SELF-CENTERING PROCESS SHIELD Public/Granted day:2014-09-18
Information query
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