Invention Grant
- Patent Title: Method and system for optical measurements
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Application No.: US14861273Application Date: 2015-09-22
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Publication No.: US09645096B2Publication Date: 2017-05-09
- Inventor: Boxiu Cai , Yi Huang
- Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
- Applicant Address: CN Shanghai
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee Address: CN Shanghai
- Agency: Anova Law Group, PLLC
- Priority: CN201410505496 20140926
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/95 ; G01N21/956

Abstract:
The present disclosure includes a method for optical measurements. The method includes providing a substrate with a structure for optical measurement on the substrate; and illuminating a light spot on the structure for optical measurement to obtain a measured light scattering spectrum. The method also includes performing a first matching process to obtain a plurality of matching standard optical scattering spectra and a plurality of first matching degrees, each standard optical scattering spectrum corresponding to one first matching degree; obtaining a plurality of combined optical scattering spectra based on the plurality of matching standard optical scattering spectra; and performing a second matching process to obtain a plurality second matching degree, each corresponding to one combined optical scattering spectrum.
Public/Granted literature
- US20160091436A1 METHOD AND SYSTEM FOR OPTICAL MEASUREMENTS Public/Granted day:2016-03-31
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