Invention Grant
- Patent Title: X-ray fluorescence analysis apparatus
-
Application No.: US14579630Application Date: 2014-12-22
-
Publication No.: US09645100B2Publication Date: 2017-05-09
- Inventor: Keiichi Tanaka , Akikazu Odawara
- Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
- Applicant Address: JP
- Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2013-265681 20131224
- Main IPC: G01N23/223
- IPC: G01N23/223 ; G01N23/20

Abstract:
An X-ray fluorescence analysis apparatus is provided with: an excitation source configured to excite an analysis target sample to emit a characteristic X-ray; an X-ray detector configured to detect the characteristic X-ray emitted from the analysis target sample; and an electromagnetic wave shield and a heat shield that are sequentially arranged from the analysis target sample toward the X-ray detector. The electromagnetic wave shield is provided with a through hole portion on which a through hole through which the characteristic X-ray passes is formed, the through hole having a size equal to or smaller than 50 μm. The heat shield is provided with a window portion through which the characteristic X-ray is passed through.
Public/Granted literature
- US20150177167A1 X-RAY FLUORESCENCE ANALYSIS APPARATUS Public/Granted day:2015-06-25
Information query