Invention Grant
- Patent Title: Salt, acid generator, photoresist composition, and method for producing photoresist pattern
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Application No.: US14964842Application Date: 2015-12-10
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Publication No.: US09645490B2Publication Date: 2017-05-09
- Inventor: Yukako Anryu , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-252629 20141215
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/32 ; C07D317/72 ; C07D321/12 ; C07C381/12 ; C07C309/06 ; C07C309/17 ; C07D327/06

Abstract:
A salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; R1 represents a C1 to C12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group; A1 represents a C2 to C8 alkanediyl group; and R2 represents a C5 to C18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and “m” represents an integer of 0, 1, 2 or 3.
Public/Granted literature
- US20160170298A1 SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN Public/Granted day:2016-06-16
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