Invention Grant
- Patent Title: Notch detection and correction in mask design data
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Application No.: US14726304Application Date: 2015-05-29
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Publication No.: US09646129B2Publication Date: 2017-05-09
- Inventor: Carlos Acosta , Daniel Salazar , Domingo Morales
- Applicant: Synopsys, Inc.
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Alston & Bird LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/36

Abstract:
Mask data is analyzed for the presence of a notch. A notch candidate on a polygon boundary of mask data is defined as a plurality of line segments that includes an initial line segment, a final line segment and at least two line segments therebetween. The initial and final line segments define adjacent edges of the notch candidate. A direction of each line segment is a direction of travel from the initial line segment to the final line segment.
Public/Granted literature
- US20150261909A1 NOTCH DETECTION AND CORRECTION IN MASK DESIGN DATA Public/Granted day:2015-09-17
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