According to one embodiment, a semiconductor memory device includes: a first active area provided in a semiconductor substrate; a second active area provided in the semiconductor substrate and intersecting with the first active area; a first select transistor comprising a first drain region provided in the first active area and a source region provided in an intersection region of the first and second active areas; a second select transistor comprising a second drain region provided in the second active area and sharing the source region; a word line coupled to gates of the first and second select transistors; and first and second variable resistance elements coupled to the first and second drain regions, respectively.