Invention Grant
- Patent Title: High speed X-ray microscope
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Application No.: US15231774Application Date: 2016-08-08
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Publication No.: US09646732B2Publication Date: 2017-05-09
- Inventor: David Lewis Adler , Benjamin Thomas Adler , Freddie Erich Babian
- Applicant: SVXR, INC.
- Applicant Address: US CA San Jose
- Assignee: SVXR, Inc.
- Current Assignee: SVXR, Inc.
- Current Assignee Address: US CA San Jose
- Agent Franklin Schellenberg
- Main IPC: G21K7/00
- IPC: G21K7/00 ; G01N23/04

Abstract:
A high resolution x-ray microscope with a high flux x-ray source that allows high speed metrology or inspection of objects such as integrated circuits (ICs), printed circuit boards (PCBs), and other IC packaging technologies. The object to be investigated is illuminated by collimated, high-flux x-rays from a movable, extended source having a designated x-ray spectrum. The system also comprises a means to control the relative positions of the x-ray source and the object; a scintillator that absorbs x-rays and emits visible photons positioned in very close proximity to (or in contact with) the object; an optical imaging system that forms a highly magnified, high-resolution image of the photons emitted by the scintillator; and a detector such as a CCD array to convert the image to electronic signals.
Public/Granted literature
- US20160351283A1 HIGH SPEED X-RAY MICROSCOPE Public/Granted day:2016-12-01
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