Invention Grant
- Patent Title: Manufacturing process for substrate structure having component-disposing area
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Application No.: US14963263Application Date: 2015-12-09
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Publication No.: US09646852B2Publication Date: 2017-05-09
- Inventor: Cheng-Jui Chang , Ming-Hao Wu
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: Jianq Chyun IP Office
- Priority: TW101143499A 20121121
- Main IPC: H05K1/00
- IPC: H05K1/00 ; H01L21/48 ; H01L23/00

Abstract:
A process for a substrate having a component-disposing area is provided, and includes the following steps. A core layer including a first surface, a metallic layer and a component-disposing area is provided. The metallic layer is disposed on the first surface and patterned to form a patterned metallic layer including pads located in the component-disposing area. A first dielectric layer is formed on the first surface and covers the patterned metallic layer. A laser-resistant metallic pattern is formed on the first dielectric layer and surrounds a projection area of the first dielectric layer. A release film is disposed on the projection area and covers a portion of the laser-resistant metallic pattern within the projection area. A second dielectric layer is formed on the first dielectric layer and covers the release film and the laser-resistant metallic pattern. A first open hole and a plurality of second open holes are formed.
Public/Granted literature
- US20160093514A1 MANUFACTURING PROCESS FOR SUBSTRATE STRUCTURE HAVING COMPONENT-DISPOSING AREA Public/Granted day:2016-03-31
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