Invention Grant
- Patent Title: Bipolar transistor structure having split collector region and method of making the same
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Application No.: US14056393Application Date: 2013-10-17
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Publication No.: US09647065B2Publication Date: 2017-05-09
- Inventor: Fu-Hsiung Yang , Long-Shih Lin , Kun-Ming Huang , Chih-Heng Shen , Po-Tao Chu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW
- Agency: Hauptman Ham, LLP
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L29/739 ; H01L29/66

Abstract:
A bipolar transistor includes a substrate and a first well in the substrate, the first well having a first dopant type. The bipolar transistor further includes a split collector region in the first well. The split collector region includes a highly doped central region having a second dopant type opposite the first dopant type; and a lightly doped peripheral region having the second dopant type, the lightly doped peripheral region surrounding the highly doped central region. A dopant concentration of the lightly doped peripheral region is less than a dopant concentration of the highly doped central region.
Public/Granted literature
- US20150108542A1 BIPOLAR TRANSISTOR STRUCTURE HAVING SPLIT COLLECTOR REGION AND METHOD OF MAKING THE SAME Public/Granted day:2015-04-23
Information query
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