Invention Grant
- Patent Title: CMOS device with double-sided terminals and method of making the same
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Application No.: US14069290Application Date: 2013-10-31
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Publication No.: US09647085B2Publication Date: 2017-05-09
- Inventor: Herb He Huang , Haiting Li , Qiang Zhou
- Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
- Applicant Address: CN Shanghai
- Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee Address: CN Shanghai
- Agency: Kilpatrick Townsend and Stockton LLP
- Priority: CN201310242364 20130618
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L21/768 ; H01L29/66 ; H01L21/8238 ; H01L23/48 ; H01L29/78 ; H01L21/762

Abstract:
A transistor device includes a semiconductor substrate having a first surface and a second surface opposite the first surface, a gate structure disposed on the first surface and configured to form a channel region, and source and drain regions disposed on opposite sides of the channel region. The device also includes a source terminal and a drain terminal disposed on the second surface. The source and drain terminals are connected to the respective source and drain regions. The transistor device further include a body terminal disposed on the second surface and configured to connect the highest or lowest voltage supply to the semiconductor substrate.
Public/Granted literature
- US20140367753A1 CMOS DEVICE WITH DOUBLE-SIDED TERMINALS AND METHOD OF MAKING THE SAME Public/Granted day:2014-12-18
Information query
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