Invention Grant
- Patent Title: Dynamically tracking spectrum features for endpoint detection
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Application No.: US14995097Application Date: 2016-01-13
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Publication No.: US09649743B2Publication Date: 2017-05-16
- Inventor: Jeffrey Drue David , Harry Q. Lee
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B37/00
- IPC: B24B37/00 ; B24B49/12 ; B24B37/013 ; B24B37/20 ; G01N21/25
Abstract:
A method of controlling polishing includes polishing a substrate and receiving an identification of a selected spectral feature, a wavelength range having a width, and a characteristic of the selected spectral feature to monitor during polishing. A sequence of spectra of light from the substrate is measured while the substrate is being polished. A sequence of values of the characteristic of the selected spectral feature is generated from the sequence of spectra. For at least some spectra from the sequence of spectra, a modified wavelength range is generated based on a position of the spectral feature within a previous wavelength range used for a previous spectrum in the sequence of spectra, the modified wavelength range is searched for the selected spectral feature, and a value of a characteristic of the selected spectral feature is determined.
Public/Granted literature
- US20160129550A1 Dynamically Tracking Spectrum Features For Endpoint Detection Public/Granted day:2016-05-12
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