Invention Grant
- Patent Title: Method for manufacturing micro-structure
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Application No.: US14305767Application Date: 2014-06-16
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Publication No.: US09650538B2Publication Date: 2017-05-16
- Inventor: Hideto Kato , Hiroshi Kanbara , Tomoyoshi Furihata , Yoshinori Hirano
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-133606 20100611
- Main IPC: G03F7/023
- IPC: G03F7/023 ; C09D163/04 ; G03F7/022 ; B81C1/00 ; G03F7/40 ; G03F7/30 ; G03F7/20

Abstract:
A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
Public/Granted literature
- US20140296380A1 METHOD FOR MANUFACTURING MICRO-STRUCTURE Public/Granted day:2014-10-02
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