Invention Grant
- Patent Title: Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate
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Application No.: US14422631Application Date: 2013-08-12
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Publication No.: US09650544B2Publication Date: 2017-05-16
- Inventor: Kohsuke Tsuchiya , Maki Asada
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP Kiyosu-Shi
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP Kiyosu-Shi
- Agency: Foley & Lardner LLP
- Priority: JP2012-184507 20120823
- International Application: PCT/JP2013/071822 WO 20130812
- International Announcement: WO2014/030570 WO 20140227
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09K3/14 ; H01L21/02
Abstract:
A polishing composition contains silicon dioxide, a water-soluble polymer, and water. An adsorbate containing at least part of the water-soluble polymer is adsorbed on the silicon dioxide. The adsorbate is contained in a concentration of 4 ppm by mass or more in terms of carbon. A percentage of the concentration of the adsorbate in terms of carbon relative to a total carbon concentration in the polishing composition is 15% or more.
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