Invention Grant
- Patent Title: Compositions for etching polysilicon
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Application No.: US14672870Application Date: 2015-03-30
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Publication No.: US09650570B2Publication Date: 2017-05-16
- Inventor: Jerome A. Imonigie , Prashant Raghu
- Applicant: MICRON TECHNOLOGY, INC.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: C09K13/08
- IPC: C09K13/08 ; H01L21/311 ; C09K13/00 ; C09K13/04 ; C09K13/06 ; H01L21/28 ; H01L27/11556 ; H01L21/3213
Abstract:
Compositions for etching polysilicon including aqueous compositions containing nitric acid, ammonium fluoride, and poly-carboxylic acid.
Public/Granted literature
- US20150203754A1 COMPOSITIONS FOR ETCHING POLYSILICON Public/Granted day:2015-07-23
Information query
