Invention Grant
- Patent Title: Mask and a method of manufacturing the same
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Application No.: US14601166Application Date: 2015-01-20
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Publication No.: US09650741B2Publication Date: 2017-05-16
- Inventor: Shengkai Pan
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Hefei, Anhui
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Hefei, Anhui
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Priority: CN201410838256 20141230
- Main IPC: H01L21/20
- IPC: H01L21/20 ; D06M15/70 ; B32B3/26 ; D06M23/00
Abstract:
The present disclosure discloses a mask that comprises a nonmetallic layer and a hollow-out pattern through the nonmetallic layer. The present disclosure further discloses a method of manufacturing the mask, which comprises manufacturing the hollow-out pattern through the nonmetallic layer.
Public/Granted literature
- US20160184854A1 MASK AND A METHOD OF MANUFACTURING THE SAME Public/Granted day:2016-06-30
Information query
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