Invention Grant
- Patent Title: Reducing background fluorescence in MEMS materials by low energy ion beam treatment
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Application No.: US14659432Application Date: 2015-03-16
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Publication No.: US09651539B2Publication Date: 2017-05-16
- Inventor: Martin Huber , Bason E. Clancy , Adam R. Hall
- Applicant: Quantapore, Inc.
- Applicant Address: US CA Menlo Park
- Assignee: Quantapore, Inc.
- Current Assignee: Quantapore, Inc.
- Current Assignee Address: US CA Menlo Park
- Agency: Levine Bagade Han LLp
- Main IPC: G01N33/487
- IPC: G01N33/487 ; B81C1/00 ; B81B7/02 ; C12Q1/68
Abstract:
Methods for fabricating materials useful for optical detection in microfluidic and nanofluidic devices, such as those used in nanopore-based nucleic acid sequencing are described herein. In certain variations, a method of reducing background fluorescence in a MEMS material may include the step of treating a surface of the MEMS material with a low energy ion beam.
Public/Granted literature
- US20160077078A1 REDUCING BACKGROUND FLUORESCENCE IN MEMS MATERIALS BY LOW ENERGY ION BEAM TREATMENT Public/Granted day:2016-03-17
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